
Kinetics Database Resources
Simple Reaction Search
Search Reaction Database
Search Bibliographic Database
Set Unit Preferences
Feedback
Rate Our Products and Services
Help
Other Databases
NIST Standard Reference Data Program
NIST Chemistry Web Book
NDRL-NIST Solution Kinetics Database
NIST Computational Chemistry Comparison and Benchmark Database
The NIST Reference on Constants, Units, and Uncertainty
More...
Administrative Links
NIST home page
MML home page
Chemical and Biochemical Reference Data Division
MML home page
Chemical and Biochemical Reference Data Division
|
Author(s):
Low, H.C.; Tedder, J.M.; Walton, J.C.
Title:
Free-radical addition to olefins, Part 22. Arrhenius parameters for the addition of trifluooromethyl radicals to vinyl monomers (CH2=CHX)
Journal:
Int. J. Chem. Kinet.
Volume:
10
Page(s):
Year:
1978
Reference type:
Journal article
Squib:
1978LOW/TED325
Reaction:
CH2CHCN + ·CF3 → CF3CH2CH(·)C≡N
Reaction order:
2
Reference reaction:
C2H4 + ·CF3 → CF3CH2CH2
Temperature:
297 - 432
K
Pressure: 0.18 bar
Rate expression:
4.47x10-14 [cm3/molecule s] e-8564 [J/mole]/RT
Bath gas:
CF3I
Category: Experiment
Data type:
Derived from fitting to a complex mechanism
Excitation technique:
Direct photolysis
Analytical technique:
Gas chromatography
View full bibliographic record.
Rate constant values calculated from the Arrhenius expression:
| T (K) | k(T) [cm3/molecule s] |
| 297 |
1.39E-15 |
| 300 |
1.44E-15 |
| 325 |
1.88E-15 |
| 350 |
2.35E-15 |
| 375 |
2.87E-15 |
| 400 |
3.40E-15 |
| 425 |
3.96E-15 |
| 432 |
4.12E-15 |
|