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Author(s):   Plumb, I.C.; Ryan, K.R.
Title:   Gas-phase reactions of CF3 and CF2 with atomic and molecular fluorine: Their significance in plasma etching
Journal:   Plasma Chem. Plasma Process.
Volume:   6
Page(s):  
Year:   1986
Reference type:   Journal article
Squib:   1986PLU/RYA11

Reaction:   ·CF3 + ·FCF4
Reaction order:   2
Temperature:   295 K
Pressure:  1.00E-3 - 9.47E-3 bar
Rate expression:   2.01x10-11 [cm3/molecule s]
Bath gas:   He
Category:  Experiment
Data type:   High or low pressure extrapolation
Excitation technique:   Electron beam
Analytical technique:   Mass spectrometry

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