NIST Chemical Kinetics Database

Author(s):   Chu, J.C.S.; Soller, R.; Lin, M.C.; Melius, C.F.
Title:   Thermal decomposition of tetramethyl orthosilicate in the gas phase: an experimental and theoretical study of the initiation process
Journal:   J. Phys. Chem.
Volume:   99
Page(s):   663 - 672
Year:   1995
Reference type:   Journal article
Squib:   1995CHU/SOL663-672

Reaction:   Si(OCH₃)4 → (CH₃O)2SiOCH₂ + CH₃OH
Reaction order:   1
Temperature:   858 - 984 K
Pressure:  0.93 bar
Rate expression:   1.6x10¹⁴ [s^-1] e^{-309298 [J/mole]/RT}
Bath gas:   Ar
Category: Theory
Data type:   Transition state theory

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Rate constant values calculated from the Arrhenius expression:

T (K)	k(T) [s^-1]
858	2.37E-5
875	5.50E-5
900	1.79E-4
925	5.48E-4
950	1.58E-3
975	4.31E-3
984	6.10E-3