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Title: Rate Constants for the Gas-Phase Reactions of Silylene with Methanol, Deuterated Methanol, and Water
Journal: J. Phys. Chem. A
Volume: 106
Page(s): 973 - 981
Year: 2002
Reference type: Journal article
Squib: 2002ALE/KIN973-981
Reaction:
CH3OH + SiH2 → Products
Reaction order:
2
Temperature:
294
K
Pressure: 0.13 - 1.07 bar
Rate expression:
1.43x10-9 [cm3/molecule s]
Uncertainty:
1.6
Bath gas:
Ar
Category: Experiment
Data type:
RRK(M) extrapolation
Pressure dependence:
Rate constant is high pressure limit
Experimental procedure:
Static or low flow - Data taken vs time
Excitation technique:
Flash photolysis (laser or conventional)
Time resolution:
In real time
Analytical technique:
Vis-UV absorption
Comments:
193 nm excimer laser photolysis of Phenylsilane producing SiH2 detected at 17,529.5 cm-1 with CW dye laser absorption. Typically 10-30 mtorr PhSiH2 and 0.5-3.5 torr reactants.
Extrapolated to high pressure limiting rate constants from RRKM/master equation modeling of observed pressure dependence. Estimated uncertainty 1.6 (NIST assigned). In this work, ab initio calculations MP2/6-311+G(d,p) were perfomred to identify mechanisms
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