NIST Chemical Kinetics Database

Author(s):   Sawrey, B.A.; O'Neal, H.E.; Ring, M.A.; Coffey, D., Jr.
Title:   The gas-phase decomposition of methylsilane. Part III. Kinetics
Journal:   Int. J. Chem. Kinet.
Volume:   16
Page(s):   31 - 39
Year:   1984
Reference type:   Journal article
Squib:   1984SAW/ONE31-39

Reaction:   CH₃SiD₃ → D₂ + CH₃DSi:
Reaction order:   1
Temperature:   1120 - 1250 K
Pressure:  6.27 bar
Rate expression:   9.77x10¹⁴ [s^-1] e^{-271052 [J/mole]/RT}
Bath gas:   CH3SiD3
Category: Experiment
Data type:   Absolute value measured directly
Excitation technique:   Thermal
Analytical technique:   Gas chromatography

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Rate constant values calculated from the Arrhenius expression:

T (K)	k(T) [s^-1]
1120	2.23E2
1125	2.54E2
1150	4.77E2
1175	8.72E2
1200	1.55E3
1225	2.71E3
1250	4.61E3