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Accessibility information
Author(s):   Doncaster, A.M.; Walsh, R.
Title:   Kinetics and mechanism of the gas phase thermal decomposition of hexachlorodisilane in the presence of iodine
Journal:   J. Chem. Soc. Faraday Trans. 1
Volume:   76
Page(s):  
Year:   1980
Reference type:   Journal article
Squib:   1980DON/WAL272

Reaction:   Si2Cl6SiCl4 + SiCl2
Reaction order:   1
Temperature:   596 - 655 K
Pressure:  5.87E-3 - 1.17E-2 bar
Rate expression:   3.09x1013 [s-1] e-206199 [±2062 J/mole]/RT
Uncertainty:   1.32000005
Bath gas:   Si2Cl6
Category:  Experiment
Data type:   Absolute value measured directly
Excitation technique:   Thermal
Analytical technique:   Mass spectrometry

View full bibliographic record.


Rate constant values calculated from the Arrhenius expression:

T (K)k(T) [s-1]
596 2.62E-5
600 3.46E-5
625 1.81E-4
650 8.32E-4
655 1.11E-3