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Author(s):
Nishida, S.; Takahashi, K.; Matsumi, Y.; Chiappero, M.; Arguello, G.; Wallington, T.J.; Hurley, M.D.; Ball, J.C.
Title:
CF3ONO2 yield in the gas phase reaction of CF3O2 radicals with NO
Journal:
Chem. Phys. Lett.
Volume:
388
Page(s):
242 - 247
Year:
2004
Reference type:
Journal article
Squib:
2004NIS/TAK242-247
Reaction:
NO + CF3O2 → CF3ONO2
Reaction order:
2
Reference reaction:
NO + CF3O2 → Products
Reference reaction order:
2
Temperature:
296
K
Pressure: 2.67E-2 bar
Rate expression:
3.5x10-3±7.0x10-4
Category: Experiment
Data type:
Relative rate value measured
Pressure dependence:
Rate constant is pressure dependent
Experimental procedure:
Static or low flow - Data taken vs time
Excitation technique:
Direct photolysis
Time resolution:
By end product analysis
Analytical technique:
Fourier transform (FTIR)
Comments:
CF3 generated by the photolysis of CF3N2CF3.
No pressure dependence above 100 Torr, but a significant effect below.
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