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Author(s):   Nishida, S.; Takahashi, K.; Matsumi, Y.; Chiappero, M.; Arguello, G.; Wallington, T.J.; Hurley, M.D.; Ball, J.C.
Title:   CF3ONO2 yield in the gas phase reaction of CF3O2 radicals with NO
Journal:   Chem. Phys. Lett.
Volume:   388
Page(s):   242 - 247
Year:   2004
Reference type:   Journal article
Squib:   2004NIS/TAK242-247

Reaction:   NO + CF3O2CF3ONO2
Reaction order:   2
Reference reaction:   NO + CF3O2 → Products
Reference reaction order:   2
Temperature:   296 K
Pressure:  2.73 bar
Rate expression:   7.6x10-3±1.5x10-3
Category:  Experiment
Data type:   Relative rate value measured
Pressure dependence:   Rate constant is pressure dependent
Experimental procedure:   Static or low flow - Data taken vs time
Excitation technique:   Direct photolysis
Time resolution:   By end product analysis
Analytical technique:   Fourier transform (FTIR)
Comments:   CF3 generated by the photolysis of CF3N2CF3.
No pressure dependence above 100 Torr, but a significant effect below.

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