NIST Chemical Kinetics Database

Author(s):   Davidson, I.M.T.; Barton, T.J.; Hughes, K.J.; Ijadi-Maghsoodi, S.; Revis, A.; Paul, G.C.
Title:   Kinetics of radical-forming homolyses in alkenyl- and tert-butyisilanes. The stability of α- and β-silicon-substituted alkyl radicals
Journal:   Organometallics
Volume:   6
Page(s):
Year:   1987
Reference type:   Journal article
Squib:   1987DAV/BAR644

Reaction:   (CH₃)3CCH₂CH₃ → tert-C₄H₉ + ·C₂H₅
Reaction order:   1
Temperature:   723 - 985 K
Pressure:  1.33 bar
Rate expression:   1.26x10¹⁶ [s^-1] e^{-320107 [±3201 J/mole]/RT}
Uncertainty:   1.25999999
Bath gas:   N2
Category: Experiment
Data type:   Absolute value measured directly
Excitation technique:   Thermal
Analytical technique:   Gas chromatography

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Rate constant values calculated from the Arrhenius expression:

T (K)	k(T) [s^-1]
723	9.42E-8
725	1.09E-7
750	6.41E-7
775	3.36E-6
800	1.58E-5
825	6.81E-5
850	2.69E-4
875	9.80E-4
900	3.33E-3
925	1.06E-2
950	3.16E-2
975	8.94E-2
985	1.33E-1