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Author(s):   Chen, W.-Y.; Matsui, H.; Wang, N.-S.
Title:   A comparative study on the production yield of H atom in the thermal decomposition of i-C4H10 and n-C4H10: Examination of the contribution of the roaming radical channels
Journal:   Chem. Phys. Lett.
Volume:   691
Page(s):   56 - 60
Year:   2018
Reference type:   Journal article
Squib:   2018CHE/MAT56-60

Reaction:   iso-C4H102-C3H7 + ·CH3
Reaction order:   1
Temperature:   1490 - 1800 K
Pressure:  1.00 bar
Rate expression:   2.15x1016 [s-1] e-347749 [J/mole]/RT
Category:  Experiment
Data type:   Derived from fitting to a complex mechanism
Pressure dependence:   None reported
Experimental procedure:   Shock tube
Excitation technique:   Thermal
Time resolution:   In real time
Analytical technique:   Vis-UV absorption
Comments:   The experimental data were obtained by monitoring the yield of H atoms in the samples of 0.2, 0.3 and 0.5 ppm i-C4H10 diluted in Ar at a fixed pressure, P = 1.00 ± 0.05 bars and in the temperature range 1490–1800 K.

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Rate constant values calculated from the Arrhenius expression:

T (K)k(T) [s-1]
1490 1.39E4
1500 1.67E4
1525 2.64E4
1550 4.11E4
1575 6.30E4
1600 9.55E4
1625 1.43E5
1650 2.11E5
1675 3.08E5
1700 4.44E5
1725 6.35E5
1750 8.97E5
1775 1.26E6
1800 1.74E6