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Title: Gas-phase reactions of CF3 and CF2 with atomic and molecular fluorine: Their significance in plasma etching
Journal: Plasma Chem. Plasma Process.
Volume: 6
Page(s):
Year: 1986
Reference type: Journal article
Squib: 1986PLU/RYA11
Reaction:
·CF2 + F2 → ·CF3 + ·F
Reaction order:
2
Temperature:
295
K
Pressure: 1.40E-3 - 1.17E-2 bar
Rate expression:
2.01x10-15 [cm3/molecule s]
Rate constant is an upper limit.
Bath gas:
He
Category: Experiment
Data type:
Absolute value measured directly
Excitation technique:
Electron beam
Analytical technique:
Mass spectrometry
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