Author(s):   Basu, S.C.; Husain, D.
Title:   Measurement of absolute rate data for the reaction of ground state atomic silicon, Si(3³P_j), with halogenated olefinic and aromatic compounds by time-resolved atomic resonance absorption spectroscopy
Journal:   Int. J. Chem. Kinet.
Volume:   19
Page(s):
Year:   1987
Reference type:   Journal article
Squib:   1987BAS/HUS1083

Associated entries:

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Rate expression: k(T) = A (T/298 K)ⁿ e^-Ea/RT
Rate expression units:
First order: s^-1
Second order: cm³/molecule s
Third order: cm⁶/molecule² s
R = 8.314472 J / mole K

Energy Units	J	Molecular Units	Molecule
Pressure Units	bar	Temperature Units	K
Base Volume Unit	cm	Reference Temperature	298.0
Evaluation Temperature	298.0

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Squib	Reaction	Temp [K]	A	Order
1987BAS/HUS1083	Benzene + Si → Products	300	4.40E-10	2
1987BAS/HUS1083	CH₂=CF₂ + Si → Products	300	4.00E-10	2
1987BAS/HUS1083	C₂HCl₃ + Si → Products	300	7.01E-10	2
1987BAS/HUS1083	C₂F₄ + Si → Products	300	1.60E-10	2
1987BAS/HUS1083	C₂Cl₄ + Si → Products	300	9.90E-10	2
1987BAS/HUS1083	1,2,4,5-Tetrafluorobenzene + Si → Products	300	3.90E-10	2
1987BAS/HUS1083	Pentafluorobenzene + Si → Products	300	4.60E-10	2
1987BAS/HUS1083	Hexafluorobenzene + Si → Products	300	4.40E-10	2
1987BAS/HUS1083	Octafluorotoluene + Si → Products	300	5.10E-10	2
1987BAS/HUS1083	Si + CH₂=CHCF₃ → Products	300	4.60E-10	2

Search returned 10 records.