Kinetics Database Logo     Home
©NIST, 2022
Accessibility information
Kinetics Database Resources

Simple Reaction Search

Search Reaction Database

Search Bibliographic Database

Set Unit Preferences

Contact Us to Submit an Article

Citation

Help


Other Databases

NIST Standard Reference Data Program

NIST Chemistry Web Book

NDRL-NIST Solution Kinetics Database

NIST Computational Chemistry Comparison and Benchmark Database

The NIST Reference on Constants, Units, and Uncertainty

More...


Administrative Links

DOC home page

NIST home page

MML home page

Chemical Sciences Division

Applied Chemicals and Materials Division

Author(s):   Tahan, A.; Shiroudi, A.
Title:   Oxidation reaction mechanism and kinetics between OH radicals and alkyl-substituted aliphatic thiols: OH-addition pathways
Journal:   Prog. React. Kinet. Mech.
Volume:   44
Page(s):   157 - 174
Year:   2019
Reference type:   Journal article
Squib:   2019TAH/SHI157-174

Reaction:   C2H5SH + ·OHH2O + CH3CH2S
Reaction order:   2
Temperature:   252 - 425 K
Pressure:  1.00E-8 - 1.00E8 bar
Rate expression:   no rate data available
Category:  Theory
Data type:   Transition state theory
Pressure dependence:   Rate constant is pressure dependent
Comments:   Reaction potential energy surface was studied using quantum chemistry and reaction channels were analyzed. Rate constants were calculated over ranges of temperatures and pressures using transition state theory and RRKM. No Arrhenius expressions are given. Rate constants are presented in tabular and graphical formats.

View full bibliographic record.