Kinetics Database Logo     Home
©NIST, 2022
Accessibility information
Kinetics Database Resources

Simple Reaction Search

Search Reaction Database

Search Bibliographic Database

Set Unit Preferences

Contact Us to Submit an Article



Other Databases

NIST Standard Reference Data Program

NIST Chemistry Web Book

NDRL-NIST Solution Kinetics Database

NIST Computational Chemistry Comparison and Benchmark Database

The NIST Reference on Constants, Units, and Uncertainty


Administrative Links

DOC home page

NIST home page

MML home page

Chemical Sciences Division

Applied Chemicals and Materials Division

Author(s):   Atkinson, R.
Title:   Kinetics of the gas-phase reactions of a series of organosilicon compounds with OH and NO3 radicals and O3 at 297 ± 2 K
Journal:   Environ. Sci. Technol.
Volume:   25
Page(s):   863 - 866
Year:   1991
Reference type:   Journal article
Squib:   1991ATK863-866

Reaction:   Hexamethylcyclotrisiloxane + ·OH → Other Products + H2O
Reaction order:   2
Reference reaction:   Cyclohexane + ·OHCyclohexyl + H2O
Reference reaction order:   2
Temperature:   297 K
Pressure:  0.99 bar
Rate expression:   7.0x10-2±1.4x10-2
Bath gas:   N2
Category:  Experiment
Data type:   Relative rate value measured
Excitation technique:   Direct photolysis
Analytical technique:   Gas chromatography

View full bibliographic record.