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Title: Kinetics of the gas-phase reactions of a series of organosilicon compounds with OH and NO3 radicals and O3 at 297 ± 2 K
Journal: Environ. Sci. Technol.
Volume: 25
Page(s): 863 - 866
Year: 1991
Reference type: Journal article
Squib: 1991ATK863-866
Reaction:
Hexamethylcyclotrisiloxane + ·OH → Other Products + H2O
Reaction order:
2
Reference reaction:
Cyclohexane + ·OH → Cyclohexyl + H2O
Reference reaction order:
2
Temperature:
297
K
Pressure: 0.99 bar
Rate expression:
7.0x10-2±1.4x10-2
Bath gas:
N2
Category: Experiment
Data type:
Relative rate value measured
Excitation technique:
Direct photolysis
Analytical technique:
Gas chromatography
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