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Author(s):   Low, H.C.; Tedder, J.M.; Walton, J.C.
Title:   Free-radical addition to olefins, Part 22. Arrhenius parameters for the addition of trifluooromethyl radicals to vinyl monomers (CH2=CHX)
Journal:   Int. J. Chem. Kinet.
Volume:   10
Year:   1978
Reference type:   Journal article
Squib:   1978LOW/TED325

Reaction:   (CH3)2C=CHCH3 + ·CF3 → CF3CH(CH3)C(·)(CH3)2
Reaction order:   2
Reference reaction:   C2H4 + ·CF3 → CF3CH2CH2
Temperature:   308 - 369 K
Pressure:  0.18 bar
Rate expression:   5.01x10-14 [cm3/molecule s] e-3800 [J/mole]/RT
Bath gas:   CF3I
Category:  Experiment
Data type:   Derived from fitting to a complex mechanism
Excitation technique:   Direct photolysis
Analytical technique:   Gas chromatography

View full bibliographic record.

Rate constant values calculated from the Arrhenius expression:

T (K)k(T) [cm3/molecule s]
308 1.14E-14
325 1.23E-14
350 1.36E-14
369 1.45E-14