Author(s):   Noda, K.; Kunioshi, N.; Fuwa, A.
Title:   Pressure Dependence of Rate Coefficients for Formation and Dissociation of Pentachlorodisilane and Related Chemical Activation Reactions
Journal:   Int. J. Chem. Kinet.
Volume:   49
Page(s):   584 - 595
Year:   2017
Reference type:   Journal article
Squib:   2017NOD/KUN584-595

Associated entries:

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Rate expression: k(T) = A (T/298 K)ⁿ e^-Ea/RT
Rate expression units:
First order: s^-1
Second order: cm³/molecule s
Third order: cm⁶/molecule² s
R = 8.314472 J / mole K

Energy Units	J	Molecular Units	Molecule
Pressure Units	bar	Temperature Units	K
Base Volume Unit	cm	Reference Temperature	298.0
Evaluation Temperature	298.0

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Squib	Reaction	Temp [K]	A	Ea [J/mole]	Order
2017NOD/KUN584-595	SiHCl₃ + SiCl₂ → SiCl₄ + SiHCl	873 - 1373	1.34E-11	1.40E05	2
2017NOD/KUN584-595	SiCl₄ + SiHCl → SiHCl₃ + SiCl₂	873 - 1373	3.65E-11	8.33E04	2
2017NOD/KUN584-595	SiCl₃SiCl: + HCl → SiHCl₃ + SiCl₂	873 - 1373	2.64E-12	4.56E04	2
2017NOD/KUN584-595	SiCl₃SiCl: + HCl → SiCl₄ + SiHCl	873 - 1373	7.36E-13	5.44E04	2
2017NOD/KUN584-595	SiCl₃ + SiHCl₂ → SiHCl₃ + SiCl₂	873 - 1373	5.23E-12	1.78E04	2
2017NOD/KUN584-595	SiCl₃ + SiHCl₂ → SiCl₄ + SiHCl	873 - 1373	1.48E-12	2.54E04	2
2017NOD/KUN584-595	SiCl₃SiHCl₂ → SiHCl₃ + SiCl₂	873 - 1373	2.10E12	1.75E05	1
2017NOD/KUN584-595	SiCl₃SiHCl₂ → SiCl₄ + SiHCl	873 - 1373	4.24E11	1.93E05	1

Search returned 8 records.