Kinetics Database Logo

Kinetics Database Resources

Simple Reaction Search

Search Reaction Database

Search Bibliographic Database

Set Unit Preferences


Rate Our Products and Services


Other Databases

NIST Standard Reference Data Program

NIST Chemistry Web Book

NDRL-NIST Solution Kinetics Database

NIST Computational Chemistry Comparison and Benchmark Database

The NIST Reference on Constants, Units, and Uncertainty


Administrative Links

NIST home page

MML home page

Chemical Sciences Division

  NIST Logo Home
©NIST, 2013
Accessibility information
Author(s):   Kunz, A.; Roth, P.
Title:   High-Temperature Kinetics of Some Si- and Cl-Containing Ceramic Precursors
Journal:   Int J. Chem. Kinet.
Volume:   33
Page(s):   741 - 754
Year:   2001
Reference type:   Journal article
Squib:   2001KUN/ROT741-754

Reaction:   SiCl4 + ·ClCl2 + SiCl3
Reaction order:   2
Temperature:   1000 - 2040 K
Pressure:  1.40 - 1.80 bar
Rate expression:   1.66x10-14 [cm3/molecule s]
Rate constant is an upper limit.
Bath gas:   Ar
Category:  Experiment
Data type:   Derived from fitting to a complex mechanism
Pressure dependence:   Rate constant is pressure dependent
Experimental procedure:   Shock tube
Excitation technique:   Flash photolysis (laser or conventional)
Time resolution:   In real time
Analytical technique:   Vis-UV absorption
Comments:   Cl from 193 nm excimer photolysis of SiCl4. ARAS Atomic resonance absorption spectroscopy detect H, Cl, Si. Model kinetics to get rate constants.

View full bibliographic record.