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Author(s):   Kerr, J.A.; Timlin, D.M.
Title:   Hydrogen abstraction reactions from organosilicon compounds. The reactions of fluoromethyl radicals with trichlorosilane. The photolyses of di- and tetrafluoroacetone
Journal:   Int. J. Chem. Kinet.
Volume:   3
Page(s):   1 - 14
Year:   1971
Reference type:   Journal article
Squib:   1971KER/TIM1-14

Reaction:   ·CHF2 + SiHCl3CH2F2 + SiCl3
Reaction order:   2
Reference reaction:   ·CHF2 + ·CHF2CHF2CHF2
Temperature:   334 - 442 K
Pressure:  2.27E-2 - 6.80E-2 bar
Rate expression:   3.49x10-13 [cm3/molecule s] e-28519 [±285 J/mole]/RT
Uncertainty:   1.100000023841858
Bath gas:   SiHCl3
Category:  Experiment
Data type:   Derived from fitting to a complex mechanism
Excitation technique:   Direct photolysis
Analytical technique:   Gas chromatography

View full bibliographic record.

Rate constant values calculated from the Arrhenius expression:

T (K)k(T) [cm3/molecule s]
334 1.21E-17
350 1.93E-17
375 3.72E-17
400 6.58E-17
425 1.09E-16
442 1.49E-16