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Title: Hydrogen abstraction reactions from organosilicon compounds. The reactions of fluoromethyl radicals with trichlorosilane. The photolyses of di- and tetrafluoroacetone
Journal: Int. J. Chem. Kinet.
Volume: 3
Page(s): 1 - 14
Year: 1971
Reference type: Journal article
Squib: 1971KER/TIM1-14
Reaction:
·CHF2 + SiHCl3 → CH2F2 + SiCl3
Reaction order:
2
Reference reaction:
·CHF2 + ·CHF2 → CHF2CHF2
Temperature:
334 - 442
K
Pressure: 2.27E-2 - 6.80E-2 bar
Rate expression:
3.49x10-13 [cm3/molecule s] e-28519 [±285 J/mole]/RT
Uncertainty:
1.100000023841858
Bath gas:
SiHCl3
Category: Experiment
Data type:
Derived from fitting to a complex mechanism
Excitation technique:
Direct photolysis
Analytical technique:
Gas chromatography
View full bibliographic record.
Rate constant values calculated from the Arrhenius expression:
| T (K) | k(T) [cm3/molecule s] |
|---|---|
| 334 | 1.21E-17 |
| 350 | 1.93E-17 |
| 375 | 3.72E-17 |
| 400 | 6.58E-17 |
| 425 | 1.09E-16 |
| 442 | 1.49E-16 |