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Accessibility information
Author(s):   Fishwick, G.; Haszeldine, R.N.; Parkinson, C.; Robinson, P.J.; Simmons, R.F.
Title:   Kinetics of the thermal decomposition of polyfluoroalkylsilicon compounds
Journal:   J. Chem. Soc. Chem. Commun.
Page(s):   382 - 384
Year:   1965
Reference type:   Journal article
Squib:   1965FIS/HAS382-384

Reaction:   CHF2CH2SiF3CH2=CHF + SiF4
Reaction order:   1
Temperature:   423 - 493 K
Rate expression:   2.0x1012 [s-1] e-137189 [J/mole]/RT
Bath gas:   CHF2CH2SiF3
Category:  Experiment
Data type:   Absolute value measured directly
Excitation technique:   Thermal
Analytical technique:   Other (direct)

View full bibliographic record.


Rate constant values calculated from the Arrhenius expression:

T (K)k(T) [s-1]
423 2.29E-5
425 2.76E-5
450 2.38E-4
475 1.64E-3
493 5.83E-3