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Title: Relative performance of a variety of NF3 + hydrogen-donor transverse-discharge HF chemical-laser systems
Journal: IEEE J. Quantum Electron.
Volume: 9
Page(s):
Year: 1973
Reference type: Journal article
Squib: 1973PEA/COW879
Reaction:
SbH3 + ·F → HF + ·SbH2
Reaction order:
2
Temperature:
298
K
Pressure: 1.33E-3 - 9.33E-2 bar
Rate expression:
1.49x10-10 [cm3/molecule s]
Bath gas:
NF3
Category: Experiment
Data type:
Absolute value measured directly
Excitation technique:
Electron beam
Analytical technique:
Other (direct)
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