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Title: Relative insertion rates of silylene and evidence for silylsilylene insertion into silicon-hydrogen and silicon-silicon bonds
Journal: J. Am. Chem. Soc.
Volume: 95
Page(s): 5168 - 5173
Year: 1973
Reference type: Journal article
Squib: 1973SEF/RIN5168-5173
Reaction:
CH3GeH3 + SiH2 → CH3GeH2SiH3
Reaction order:
2
Reference reaction:
Si2H6 + SiH2 → Si3H8
Reference reaction order:
2
Temperature:
623
K
Rate expression:
2.0x10-1±5.0x10-2
Bath gas:
He
Category: Experiment
Data type:
Relative rate value measured
Excitation technique:
Thermal
Analytical technique:
Gas chromatography
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