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Author(s):   Sefcik, M.D.; Ring, M.A.
Title:   Relative insertion rates of silylene and evidence for silylsilylene insertion into silicon-hydrogen and silicon-silicon bonds
Journal:   J. Am. Chem. Soc.
Volume:   95
Page(s):   5168 - 5173
Year:   1973
Reference type:   Journal article
Squib:   1973SEF/RIN5168-5173

Reaction:   CH3GeH3 + SiH2 → CH3GeH2SiH3
Reaction order:   2
Reference reaction:   Si2H6 + SiH2Si3H8
Reference reaction order:   2
Temperature:   623 K
Rate expression:   2.0x10-1±5.0x10-2
Bath gas:   He
Category:  Experiment
Data type:   Relative rate value measured
Excitation technique:   Thermal
Analytical technique:   Gas chromatography

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