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Author(s):   Low, H.C.; Tedder, J.M.; Walton, J.C.
Title:   Free-radical addition to olefins, Part 22. Arrhenius parameters for the addition of trifluooromethyl radicals to vinyl monomers (CH2=CHX)
Journal:   Int. J. Chem. Kinet.
Volume:   10
Page(s):  
Year:   1978
Reference type:   Journal article
Squib:   1978LOW/TED325

Reaction:   CH2=CHBr + ·CF3 → CF3CH2CHBr
Reaction order:   2
Reference reaction:   C2H4 + ·CF3 → CF3CH2CH2
Reference reaction order:   2
Temperature:   317 - 429 K
Pressure:  0.18 bar
Rate expression:   6.3x10-1 e2594 [±804 J/mole]/RT
Bath gas:   CF3I
Category:  Experiment
Data type:   Relative rate value measured
Excitation technique:   Direct photolysis
Analytical technique:   Gas chromatography

View full bibliographic record.


Rate constant values calculated from the Arrhenius expression:

T (K)k(T) []
317 1.69E0
325 1.65E0
350 1.54E0
375 1.45E0
400 1.37E0
425 1.31E0
429 1.30E0