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Author(s):   Michael, J.V.; Nava, D.F.; Payne, W.A.; Lee, J.H.; Stief, L.J.
Title:   Rate Constant for the Reaction H + NO2 from 195 to 400 K with FP-RF and DF-RF Techniques
Journal:   J. Phys. Chem.
Volume:   83
Year:   1979
Reference type:   Journal article
Squib:   1979MIC/NAV2818

Reaction:   NO2 + ·OH + NO
Reaction order:   2
Temperature:   195 - 400 K
Pressure:  4.00E-2 - 0.16 bar
Rate expression:   1.41x10-10 [±2.49x10-11 cm3/molecule s]
Bath gas:   Ar
Category:  Experiment
Data type:   Absolute value measured directly
Excitation technique:   Flash photolysis (laser or conventional)
Analytical technique:   Resonance fluorescence

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