Kinetics Database Logo

Kinetics Database Resources

Simple Reaction Search

Search Reaction Database

Search Bibliographic Database

Set Unit Preferences


Rate Our Products and Services


Other Databases

NIST Standard Reference Data Program

NIST Chemistry Web Book

NDRL-NIST Solution Kinetics Database

NIST Computational Chemistry Comparison and Benchmark Database

The NIST Reference on Constants, Units, and Uncertainty


Administrative Links

NIST home page

MML home page

Chemical Sciences Division

  NIST Logo Home
©NIST, 2013
Accessibility information
Author(s):   Vanhaelemeersch, S.; Van Hoeymissen, J.; Vermeylen, D.; Peeters, J.
Title:   SiF2 as a primary desorption product of Si etching by F atoms: interpretation of laser-induced fluorescence spectra; rate constant of the gas phase SiF2 + F reaction
Journal:   J. Appl. Phys.
Volume:   70
Page(s):   3892 - 3898
Year:   1991
Reference type:   Journal article
Squib:   1991VAN/VAN3892-3898

Reaction:   SiF2 + ·FSiF3
Reaction order:   2
Temperature:   298 K
Pressure:  1.33E-3 - 6.67E-3 bar
Rate expression:   5.0x10-13 [±9.96x10-14 cm3/molecule s]
Bath gas:   He
Category:  Experiment
Data type:   Absolute value measured directly
Excitation technique:   Electron beam
Analytical technique:   Laser induced fluorescence

View full bibliographic record.