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Accessibility information
Author(s):   Mick, H.J.; Roth, P.
Title:   Shock tube study of silicon atom oxidation by CO and CO2
Journal:   J. Phys. Chem.
Volume:   98
Page(s):   7844 - 7847
Year:   1994
Reference type:   Journal article
Squib:   1994MIC/ROT7844-7847

Reaction:   CO2 + SiCO + SiO
Reaction order:   2
Temperature:   2100 - 3160 K
Pressure:  0.41 - 1.41 bar
Rate expression:   9.96x10-10 [cm3/molecule s] e-78322 [J/mole]/RT
Bath gas:   Ar
Category:  Experiment
Data type:   Absolute value measured directly
Excitation technique:   Thermal
Analytical technique:   Vis-UV absorption

View full bibliographic record.

Rate constant values calculated from the Arrhenius expression:

T (K)k(T) [cm3/molecule s]
2100 1.12E-11
2200 1.38E-11
2300 1.66E-11
2400 1.97E-11
2500 2.30E-11
2600 2.66E-11
2700 3.04E-11
2800 3.45E-11
2900 3.87E-11
3000 4.31E-11
3100 4.77E-11
3160 5.06E-11