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Author(s):   Chu, J.C.S.; Soller, R.; Lin, M.C.; Melius, C.F.
Title:   Thermal decomposition of tetramethyl orthosilicate in the gas phase: an experimental and theoretical study of the initiation process
Journal:   J. Phys. Chem.
Volume:   99
Page(s):   663 - 672
Year:   1995
Reference type:   Journal article
Squib:   1995CHU/SOL663-672

Reaction:   Si(OCH3)4 → (CH3O)2SiOCH2 + CH3OH
Reaction order:   1
Temperature:   858 - 984 K
Pressure:  0.93 bar
Rate expression:   1.6x1014 [s-1] e-309298 [J/mole]/RT
Bath gas:   Ar
Category:  Theory
Data type:   Transition state theory

View full bibliographic record.

Rate constant values calculated from the Arrhenius expression:

T (K)k(T) [s-1]
858 2.37E-5
875 5.50E-5
900 1.79E-4
925 5.48E-4
950 1.58E-3
975 4.31E-3
984 6.10E-3