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Author(s):   Sugawara, K.; Ito, F.; Nakanaga, T.; Takeo, H.
Title:   Formation of SiF2 in the infrared multiphoton decomposition of Si2F6 and the reactions of SiF2 with Br2, NO2 and C2H4
Journal:   Chem. Phys. Lett.
Volume:   232
Page(s):   561 - 566
Year:   1995
Reference type:   Journal article
Squib:   1995SUG/ITO561-566

Reaction:   O2 + SiF2 → Products
Reaction order:   2
Temperature:   298 K
Pressure:  1.31E-3 - 1.30E-2 bar
Rate expression:   1.0x10-16 [cm3/molecule s]
Rate constant is an upper limit.
Bath gas:   O2
Category:  Experiment
Data type:   Absolute value measured directly
Excitation technique:   Flash photolysis (laser or conventional)
Analytical technique:   Other (IR)

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