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Author(s):   Stavitskii, I.P.; Chichinin, A.I.
Title:   Quenching of O(1D) atoms by NF3 and XeF2
Journal:   Chem. Phys. Reports
Volume:   17
Page(s):   2009 - 2019
Year:   1999
Reference type:   Journal article
Squib:   1999STA/CHI2009-2019

Reaction:   O(1D) + SiF4SiF4 +
Reaction order:   2
Temperature:   298 K
Pressure:  1.33E-2 bar
Rate expression:   1.4x10-10 [cm3/molecule s]
Rate constant is an upper limit.
Bath gas:   He
Category:  Experiment
Data type:   Absolute value measured directly
Excitation technique:   Flash photolysis (laser or conventional)
Time resolution:   In real time
Analytical technique:   Laser magnetic resonance (LMR)

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