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Author(s):   Alexander, U.N.; King, K.D.; Lawrance, W.D.
Title:   Rate Constants for the Gas-Phase Reactions of Silylene with Methanol, Deuterated Methanol, and Water
Journal:   J. Phys. Chem. A
Volume:   106
Page(s):   973 - 981
Year:   2002
Reference type:   Journal article
Squib:   2002ALE/KIN973-981

Reaction:   CH3OH + SiH2 → Products
Reaction order:   2
Temperature:   294 K
Pressure:  0.13 - 1.07 bar
Rate expression:   1.43x10-9 [cm3/molecule s]
Uncertainty:   1.60000002
Bath gas:   Ar
Category:  Experiment
Data type:   RRK(M) extrapolation
Pressure dependence:   Rate constant is high pressure limit
Experimental procedure:   Static or low flow - Data taken vs time
Excitation technique:   Flash photolysis (laser or conventional)
Time resolution:   In real time
Analytical technique:   Vis-UV absorption
Comments:   193 nm excimer laser photolysis of Phenylsilane producing SiH2 detected at 17,529.5 cm-1 with CW dye laser absorption. Typically 10-30 mtorr PhSiH2 and 0.5-3.5 torr reactants.

Extrapolated to high pressure limiting rate constants from RRKM/master equation modeling of observed pressure dependence. Estimated uncertainty 1.6 (NIST assigned). In this work, ab initio calculations MP2/6-311+G(d,p) were perfomred to identify mechanisms

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