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Author(s):   Chen, L.; Uchimaru, T.; Kutsuna, S.; Tokuhashi, K.; Sekiya, A.
Title:   Kinetics of the Gas-Phase Reactions of CHX=CFX (X = H, F) with OH (253-328 K) and NO3 (298 K) Radicals and O3 (236-308 K)
Journal:   Int. J. Chem. Kinet.
Volume:   42
Page(s):   619 - 628
Year:   2010
Reference type:   Journal article
Squib:   2010CHE/UCH619-628

Reaction:   CH2=CHF + ·OH → Products
Reaction order:   2
Temperature:   253 - 328 K
Pressure:  0.27 bar
Rate expression:   1.2x10-12 [±3.7x10-13 cm3/molecule s] e3409 [±748 J/mole]/RT
Category:  Experiment
Data type:   Relative value normalized by a reference value
Pressure dependence:   None reported
Experimental procedure:   Static or low flow - Data taken vs time
Excitation technique:   Direct photolysis
Time resolution:   By end product analysis
Analytical technique:   GC-MS
Comments:   The errors reported are ±2 standard deviations and represent precision only. Pentane and cyclohexane were used as reference compounds.

View full bibliographic record.

Rate constant values calculated from the Arrhenius expression:

T (K)k(T) [cm3/molecule s]
253 6.07E-12
275 5.33E-12
300 4.71E-12
325 4.24E-12
328 4.19E-12